for Electronic Devices (Sputtering & Ion Plating)
Ion Plating Equipment using Hollow Cathode System SIH-400T
HCD / Gun system
- Most suitable to form decorative films for accessories.
- Most suitable to form cured coating films for tools.
- Enables the touch panel operation to control film forming recipes.
- Most suitable machine for small-volume production or for experiment.
- Enables the film-forming color to be changed by varying the volume and types of introduced gas (N2, O2, and H2).
- Vacuum chamber
- Φ400 × H500mm
- Vapor source
- HCD / Gun
Water cooling hearth
- Work retention mechanism
- Rotation / revolution or Revolution jigs
- Work heater
- Sheath heater
- Measuring system
- Pirani vacuum gauge
Penning vacuum gauge
- Pumping system
- Compound molecular pump
Oil rotary pump
- Bias power supply
- 100V - 10A
- Bombardment power supply
- 500V - 1A
- Gas introduction system
- 4 lines
- Equipment proper; approx. W1340 × D1120 × H1938
- Equipment proper; approx. 1000kg
- Φ3 200V AC, approx. 29 kVA (84A)
- Water volume
- approx. 1.6m3/hr (approx. 27L/min)
Differential pressure: 0.2 MPa or higher
- Compressed air
- approx. 0.5 MPa or higher
*For the improvement of product, please understand that the specifications are subject to change without prior notice.
**This product may be applicable to export control products such as strategic raw materials which are regulated by the Foreign Exchange and Foreign Trade Control Law.
Accordingly when you bring out the applicable products outside Japan. You should take a necessary action such as application of an export permit to the Government of Japan.