for Electronic Devices (Sputtering & Ion Plating)
Arc-Discharge-Type Ion Plating Equipment SIA-400T
For forming a surface hardened film.
Ideal as a small-quantity production machine / experimental machine.
General Outline
- An arc discharge is generated on the surface of the evaporation source, and a thin film is formed through dissolution, evaporation, and ionization.
- It is possible to form a TiN and TiAlN cured film.
Features
- It is possible to form a surface-hardened film (TiN, TiAlN film) on cutting tools.
- The installation area is within W3,000mm x D2,500mm, which saves space.
- Film formation recipe control is possible by touch panel operation.
- Ideal as a small-quantity production machine / experimental machine.
- Evaporation of refractory metals (tungsten or molybdenum) is also possible.
Applications
Cutting tools
Automobile / Mechanical parts
Various molds
Film Formation Example
Specifications
- Vacuum Chamber
- Approx. W350mm × D475mm × H400mm, made of SUS304
- Installation Area
- ①Body: approx.W1600mm×D1000mm×H1600mm
②Operation panel: approx.W565mm×D820mm×H1800mm
③Pump stand: approx.W400mm×D800mm×H910mm
- Required Electricity
- Main body Φ3 200V Approximately 38.3KVA (110.5A)
*For the improvement of product, please understand that the specifications are subject to change without prior notice.
**This product may be applicable to export control products such as strategic raw materials which are regulated by the Foreign Exchange and Foreign Trade Control Law.
Accordingly when you bring out the applicable products outside Japan. You should take a necessary action such as application of an export permit to the Government of Japan.
