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Product Information for Quartz Devices for Electronic Devices for Optical Devices Components New Technology Application Examples

Components

Ion source for Etching IGF series
          - Ideal for etching of individual devices -

IGF-201の画像 IGF001の画像

General Outline

By emitting various ion beams to a device from a small ion source and combining it with a shutter, individual etching is possible.

Features / Options

  1. IGF-001：Beam diameter: about φ5㎜
  2. IGF-201：Beam diameter: about 5㎜ × L100㎜

Applications

Individual etching of piezoelectric devices (crystal oscillator, SAW filter, etc.), wafer planarization, etc.

*For the improvement of product, please understand that the specifications are subject to change without prior notice.
**This product may be applicable to export control products such as strategic raw materials which are regulated by the Foreign Exchange and Foreign Trade Control Law. Accordingly when you bring out the applicable products outside Japan. You should take a necessary action such as application of an export permit to the Government of Japan.

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