Etching Equipment

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Batch Type RIE Equipment
SPE-8000 Series

Batch type RIE equipment standard model

It is a batch type RIE equipment with high processing capacity.
24 wafers of 4-inch or 11 wafers of 6-inch can be processed simultaneously.
The atmosphere transfer chamber is compatible with cassette and use a dual-arm robot to enable efficient transfer.

Applications

RIE processing for various wafer electronic components

Features

  1. 1. Mass batch processing is possible as RIE.
  2. 2. By using a dual-arm robot to transfer wafers, wafers can be efficiently replaced from the cassette.
  3. 3. Etching distribution: within ± 5%, Cycle time: 20min/batch

Specifications

Exhaust Pump DRP+MBP+TMP
Installation Dimensions W2,800mm×D2,400mm×H2,025mm
Weight 2,400kg
Power Supply Capacity AC200V(3φ)/25kVA(73A)