Load Lock Type Carousel Model Sputtering Equipment
SPC-2507-Ⅱ
Sputtering equipment capable of forming two types of films on both sides
This device is a small carousel type sputtering device that has a substrate reversal function and can perform double-sided film deposition. Since the film is formed intermittently, it can be formed at a low temperature of 130℃ or less. It is also effective as a measure to prevent the diffusion of Cr.
Applications
Formation of metal films for electrodes on various electronic components
Features
- 1. Outer dimensions: W1,280mm×D1,150mm×H2,250mm, Lower height
- 2. Low temperature deposition is possible by suppressing the temperature increase during sputtering to solve the heat problem that could not be solved with the pass-through type SPH-2500T-II.
- 3. Non-contact power transmission method using magnets (MagTran) is adopted for substrate rotation and reversal mechanism.
*MagTran ® is a registered trademark of FEC Corporation. - 4. Power exchange function, for adjusting the film thickness distribution in the rotational direction.（optional）
- 5. Cathode (3rd source) （optional）
outline
| Cathode | 5inch×7inch One cathode each |
|---|---|
| Substrate Tray | Forφ4：Tray W120mm×H200mm |
| Mask Effective Range | Forφ4：Tray W100mm |
| Number of Axes | Forφ4：12-axes |
| Number of Wafers | Forφ4：12wafers |
Specifications
| Exhaust Pump | RP＋CRYO |
|---|---|
| Installation Dimensions | W1,280mm×D1,150mm×H2,250mm |
| Weight | 1,500kg |
| Power Supply Capacity | AC200～220V／17kVA(50A) |