Vacuum Deposition Equipment for Plasma-resistant Films
SEC-S1300i
Thick Y₂O₃ film with high corrosion resistance can be deposited and shield film can be formed.
This equipment is capable of thick film deposition of plasma resistant film (Y₂O₃ film).
Ion-assisted deposition(IAD) can form dense, strong, corrosion-resistant Y₂O₃ films with high packing density.
Applications
Dry etcher for semiconductors
Shield coating on internal parts of CVD equipment
Features
- 1. Thick film deposition
- 2. RF Ion Source
Options
Ion plating ／ 2-ource simultaneous deposition ／ Self-rotating jig ／ Polyhedral dome
Specifications
| Exhaust Pump | DP＋RP＋MBP(Meissner Trap) |
|---|---|
| Installation Dimensions | W4,500mm×D3,900mm×H2,720mm |
| Weight | Approx. 4,500kg |
| Power Supply Capacity | AC200～220V(φ3)／95kVA(275A) |