Vacuum Deposition Equipment
Sapio Series
（SGC-S900/1300/1550/1700）
High-performance model in pursuit of batch-to-batch deposition reproducibility
Applications
Optical multilayer filter (IR cut filter, band pass filter, etc.) ／ Various antireflective films ／ Increasing reflection mirror ／ Forming optical multilayer DBR film for LED, etc.
General Outline
Reproducibility of film formation
A newly developed fiber-type optical monitor and disk-type 80-point monitor glass capable of stable temperature control are used. Achieves high accuracy with designed characteristics.
Film quality stability
By exhaust gas measures thoroughly, even if the inside of the tank is dirty, it achieves stabilization of film quality as well as characteristics.
Low particle
Count plan to turbulence flow, antifouling near evaporation source and tuning electron beam gun realized “LOW particle”
High-power ion source
Equipped with a high-power ion source designed specifically for Sapio, it supports a wide range of film formation from multilayer optical filters to resin substrates.
Features
- 1. High efficiency exhaust system
- 2. High precision film thickness control system Wavenavigator, Lafio-PLUS
- 3. High Power, Large Area Irradiated RF Ion Source ISG Series
- 4. Low particle specification (optional)
Specifications
| Vacuum chamber size[mm] | φ900 | φ1300 | φ1550 | φ1700 |
|---|---|---|---|---|
| Exhaust Pump | 22 inchDP×1 Meissner trap | 22 inchDP×2 Meissner trap | 26 inchDP×2 Meissner trap | |
| Installation Dimensions | W4,000mm×D5,800mm×H2,637mm | W4,500mm×D6,000mm×H2,730mm | W4,900mm×D6,500mm×H3,166mm | W5,000mm×D7,000mm×H3,024mm |
| Weight | 4,685kg | 6,546kg | 9,301kg | 9,341kg |
| Power Supply Capacity | AC200～220V Approx.80kVA | AC200～220V Approx.89kVA | AC200～220V Approx.128kVA | AC200～220V Approx.126kVA |
Reproducibility performance
The adoption of a newly developed fiber-type optical monitor and an 80-point monitor glass mechanism that enables stable temperature control have realized high accuracy that can obtain the characteristics as designed.
In addition, by incorporating the technology to stabilize the quality of vacuum and the technology to make it less susceptible to contamination, the above-mentioned characteristics are realized without correcting the condition of the IR cut filter.
Result of 20 batches continuous test
・With no condition correction(same condition)
・No cleaning
・3 samples (upper, middle and lower) Total 60
・half wavelength 680±6.5nm(T=50%)
LED DBR (Distributed Bragg Reflector) film formation
Reasons for choosing DBR
Al film, Al + reflection film
・Crystal defects occur due to stress caused by thermal deformation. It leads to the deterioration of the product.
・There is a limit to the increase of reflectance in Al reflective film.
DBR (dielectric multilayer film mirror)
・There is little deterioration due to thermal deformation
・Realization of high reflectance that cannot be obtained with aluminum reflective film
LED device configuration
DBR spectral characteristics example
High speed APC + Vacuum gauge
Control not to be affected when pressure fluctuation occurs
Rapid pressure control is required to suppress the effects of released gases during film formation. The combination of a high response vacuum gauge and a newly developed high speed APC (automatic pressure regulator) has resulted in amazing pressure control
High speed APC + Vacuum gauge
Monitor glass mechanism
If the pressure during film formation differs, not only the film quality such as the refractive index but also the film thickness on the substrate will be affected. This is mainly due to the difference in pressure atmosphere between the monitor glass that is performing film thickness control and the substrate, and a structure to minimize this difference has been obtained through various verification experiments. As compared with conventional vapor deposition machines, it has become possible to reduce the amount of film thickness fluctuation due to pressure changes to about 1/30.
Non-contact dome rotation mechanism(Optional specification)
No dust from the gear section.
There is no rotation introduction seal. Maintenance is easy because this mechanism is outside the chamber.
In optical thin film production, the problem of particles on the substrate is a very important factor now and in the future. Therefore, we considered that the reduction of the dust source in the vacuum chamber as much as possible was also a task imposed on the deposition equipment, and made it possible to select a mechanism that adopts Magtran that transmits rotational power without contacting. Unlike gears and the like, because Magtran is non-contact, there are no wear or dust generation, and low maintenance.
*MagTran® is a registered trademark of FEC Corporation.