High power RF Ion Source
ISG Series
Achieves a wide range of stable ion irradiation
Achieves a wide range of stable ion irradiation, and it can be used in a variety of applications from non-shift films of optical filters to adhesion improvement to resin substrates.
With regard to discharge performance, a unique approach enables reliable ignition and stable discharge.
Applications
Ion-assisted deposition of optical thin films
Etching process of substrate surface
Features
- 1. High-power ion source with a beam current of 1,500mA / beam voltage of 1,500V / ion current density of 100 μA / c㎡ or more.
- 2. Achieved high power uniformity of ion current density distribution ± 5% or less.
* It is a measurement result with Sapio-1300. It is limited to our designated condition. - 3. Stabilize the neutralizer by adopting an auto matcher and achieve a large output of emission current of 3,000mA by adopting a newly developed collector electrode (patent no. 5636931 ). Prevents particle generation due to charge up.