for Optical Devices
Vacuum evaporation system SGC-S1700
Ideal for film formation on resin substrates!
Realizes mass production at high level.
General Outline
It is a mass-production-ready device that has been polished for cost performance while incorporating the Sapio series technology.
This system is suitable for film formation on resin substrates.
In addition, various specifications can be selected such as RF ion source, optical monitor, and inverting pallet.
Features / Options
- Through the adoption of high efficiency exhaust system, compared with φ1, 300 vapor deposition equipment, the coating treatment time only increases by about 10%.
- The number of stored substrates per batch is twice or more of φ1, 300 deposition equipment.
- Space saving in the installation area, compact design with reduced overall height.
Applications
Anti-reflection film formation on resin substrate
Optical mirror
Specifications
- Processing method
- Batch type
- Exhaust pump
- 26 inches DP x 2 + RP + MBP + Meissner trap
- Installation dimensions
- W4,800㎜ × D7,600㎜ × H3,100㎜
- Equipment weight
- 9,500 kg
- Power supply capacity
- AC 200 V (3φ) / about 135 kVA
- Chamber size
- φ1,700㎜
*For the improvement of product, please understand that the specifications are subject to change without prior notice.
**This product may be applicable to export control products such as strategic raw materials which are regulated by the Foreign Exchange and Foreign Trade Control Law.
Accordingly when you bring out the applicable products outside Japan. You should take a necessary action such as application of an export permit to the Government of Japan.
