New Technology
Optical Thin Film Formation Equipment Genesis-AR series
Optimum for the film formation on high curvature lenses and ball lenses,
which was difficult by vapor deposition or sputtering.
Outline
This new equipment is able to form thin films on ball lenses and high curvature
lenses with excellent uniform coverage as well as high quality, by using
ALD (Atomic Layer Deposition) methods instead of general methods such
as vaper deposition and sputtering.
Application film type : SiO2, TiO2, Al2O3
Main Specifications
- Maximum 50 pieces of φ10 inch substrates can be processed by batch.
(25
pieces × 2 axis)
*The number of the processing varies according to the shape and conditions
of substrates.
- The substrates rotary mechanism is attached.
Features
- Able to form films with excellent uniform coverage on high curvature
lenses.
- Able to perform the film thickness control only by management for a film formation cycle.
- Able to form films on the substrates such as olefin-based resin, which require low temperature film formation.
- Superior film thickness distribution in a batch and between batches.
- Supporting electric power saving and spacing-saving.
- Available for expansion to automation.
Main Uses and Application Examples
- Forming anti-reflection films on ball lenses and gullwing lenses
- Forming optical thin films on high curvature lenses and resin lenses
- Forming uniform films on complex-shaped substrates
*For the improvement of product, please understand that the specifications are subject to change without prior notice.
**This product may be applicable to export control products such as strategic raw materials which are regulated by the Foreign Exchange and Foreign Trade Control Law.
Accordingly when you bring out the applicable products outside Japan. You should take a necessary action such as application of an export permit to the Government of Japan.
